JSW AFTY, part of Japan Steel Works, specializes in thin-film deposition equipment, with its technology heritage rooted in ECR (Electron Cyclotron Resonance) plasma deposition. Its portfolio covers ECR plasma deposition and atomic layer deposition (ALD) systems, enabling low-temperature, low-damage film formation as well as highly controlled conformal deposition on high-aspect-ratio and 3D structures. The company provides equipment development, manufacturing, process support and after-sales services for advanced electronic-device applications.
AFTEX-6000
Standard of Laser AR/HR Coating
Solid-source ECR plasma deposition to form multi-layer films from a large number of materials:
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3-4'', 2 ECR sources
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Membranes and multi-layer films of SiO2, Si3N4 and Si
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High refractive index control
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High-reactivity deposition
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Low-temperature, low-damage, surface cleaning effect
AFTEX-8000
Mass production ECR Sputter
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up to 8'', 2 ECR sources
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High-quality film formation under high density plasma
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Wide range of materials: SiO2, Si3N4 and Si, Al2O3, AlN, Ta2O5, HfO2, ZrO2, ITO, STO, etc.
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High crystallinity films can be formed at low temperature with low damage
AFTEX-9000
Mass production cluster tool
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up to 8'', 1 ECR sources in each of up to 3 chambers
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100+ systems installed worldwide
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Large variation of materials (oxides, nitrides) and safety gases (argon, oxygen, nitrogen)
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Controllability of refractive index
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High-quality and less-demage surface treatment
