Forge Nano, based in Thornton, Colorado, is a pioneering materials science company that develops advanced atomic layer deposition ALDˣ technologies to precisely engineer material surfaces and unlock enhanced performance across industries such as energy storage, semiconductors, and advanced manufacturing. Founded in 2011 and trusted by leading industrial partners, Forge Nano is driving innovation from research-scale tooling to industrial-scale production solutions that strengthen critical infrastructure worldwide.
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Forge Nano’s semiconductor wafer fabrication equipment applies ultra-thin, atomically precise coatings that unlock higher device performance, improved yield, and advanced material integration. Engineered for high-throughput production, these systems deliver conformal coatings at lower precursor consumption, reducing cost of ownership while enabling next-generation device architectures.
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Its proprietary Atomic Armor™ platform removes constraints like thermal instability or surface degradation at the atomic level. We deliver faster-charging batteries, flawless semiconductor yields, and high-strength structural components—reinforcing the material foundations of national security to ensure the world’s most critical systems perform at scale.
Thermal Ald for Semiconductor
THEIA
Single Chamber R&D Scale Equipment
Forge Nano’s Theia system is capable of ALDˣ processing on single wafers from 75mm to 200mm sizes. Unique or irregular substrates are easily enabled with customization available upon request.
TEPHRA
High Volume Manufacturing Cluster
TEPHRA is Forge Nano’s single-wafer, thermal ALDˣ cluster tool dedicated to high volume manufacturing of specialty semiconductor applications on 200 mm wafers and below. It is built for high throughputs, efficient chemical use and low-risk manufacturing, setting new benchmarks for thermal ALDˣ productivity.
Cluster tool with up to 8-sided platform with up to six process modules enables highest throughput and sequential processing under vacuum minimizing cross contamination. This way, metal barrier seed in TSV can be processed on one tool with one process chamber each for oxide, nitride and metal.
TEPHRAOne
Automated Pilot Production
A fully automated 200mm single-module platform. Outfitted with flagship ALDˣ features in a streamlined configuration for process qualification.
Single process module with cassette load lock and fully automated wafer cassette processing, mainly for applications requiring a single layer or nanolaminate (moisture barriers or passivation layers)
Single-Wafer Automation – Optimized for up to 200mm wafers.
100% Recipe Transfer – Seamless migration to full cluster tools.
SMFD-ALD Enabled – Dynamic and coordinated control for high-speed ALD.
Powder ALD
LITHOS
High-Volume Industrial Hardening
Eliminate the economic and technical barriers to mass-market ALD. Lithos transitions atomic-scale surface engineering from a lab-scale luxury to a high-throughput industrial standard, enabling the hardening of critical materials at a global scale.
Massive Throughput – Rotary batch architecture capable of processing 1,000+ kg per batch, scaling to 10,000 kg/day.
Disruptive Economics – Achieves competitive coating
PROMETHEUS
The Global Standard for Particle ALD Pilot Development
Establish the repeatable “Gold Standard” for your performance materials. Prometheus bridges the gap between lab-scale discovery and industrial pilot production.
Pilot Scale – Optimized for single gram to 20kg batches
Jet Assist Technology – Proprietary fluidization designed for cohesive and sensitive nano-powders
Thermal Range – High performance manifold and reactor heating up to 350°C.
PANDORA
Rapid Chemistry Screening for Particle Discovery
Accelerate the R&D cycle by screening new coatings and precursors in hours, not weeks.
Batch Size – 100ml rotary reactor optimized for milligram to gram-scale research
Agitation – Continuous rotary motion ensures 360° precursor exposure for every particle
Precision Channels – Up to 8 independent precursor inlets for complex nano laminate structures
Versatility – Engineered for gas, liquid and solid precursor chemistries
