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Suzhou Delphi Laser is a Chinese supplier of high-precision laser micromachining equipment for semiconductor, electronics and advanced manufacturing applications. Its semiconductor portfolio covers laser-based wafer and device processing including dicing, grooving, scribing, marking, drilling, edge trimming, debonding and laser annealing, with solutions for silicon, SiC, GaAs, lithium tantalate, lithium niobate and glass.

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Delphi Laser has a particular focus on third-generation semiconductors and advanced packaging, offering equipment for SiC ingot slicing, wafer processing, TGV drilling, low-k grooving, laser debonding and laser-assisted welding. Its broader portfolio also includes laser cutting and processing solutions for displays, electronics and photovoltaics.

LASER REMOVAL AND SEPARATION

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Delphi Laser offers a variety of standalone or integrated laser processing systems for micromachining of a wide range of semiconductor materials. Main advantages include:

  • Laser-based material removal, cutting & separation

  • Pulsed UV / ultrafast lasers for precise, localized energy delivery (own laser sources)

  • Selective modification, ablation or separation with minimal mechanical force

  • Non-contact processing of hard, brittle and thin materials

  • Integrated laser, optics, motion control and automation

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Available processes:

  • Slicing: SiC, GaN, Ga₂O₃, LiTaO₃, LiNbO₃

  • Dicing: full cut, notch cut, stealth dicing, Taiko ring

  • Scribing/grooving: wafer scribing, low-k grooving

  • Drilling: TGV, TSV, TMV

  • Etching: selective material removal

  • Film removal: selective removal of films/coatings

  • Cleaning: BEOL

  • Trimming: BEOL and WLP

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LASER Annealing, Marking & DeBonding

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Delphi Laser offers a variety of standalone or integrated laser processing systems for micromachining of a wide range of semiconductor materials. Main advantages include:

  • Laser-induced modification of semiconductor materials and surfaces

  • Localized laser energy enables controlled thermal or structural modification

  • Non-contact processing with digitally controlled energy and positioning

  • Integrated automation for wafer and package handling

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Available processes:

  • Annealing: SiC/GaN (backside) activation

  • Debonding: release of temporary bonded wafer

  • Marking: wafer- and package level

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Support processes for integration:

  • Mechanical cleaving

  • Tape expansion

  • Tape removal/mounting

  • Adhesive residue removal

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Need more details? Contact us!

We are here to assist. Contact us by phone or email.

CONTACT
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